Hitachi High-Tech Launches the GT2000, High-Precision Electron Beam Metrology System to Meet the Needs of Semiconductor Devices Development and Mass Production in the High-NA EUV Generation
TOKYO, Dec 12, 2023 - (JCN Newswire) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its GT2000 high-precision electron beam metrology system.
- TOKYO, Dec 12, 2023 - (JCN Newswire) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its GT2000 high-precision electron beam metrology system.
- GT2000 is equipped with new detection systems to cutting-edge 3D semiconductor devices.
- It also utilizes low-damage high-speed multi-point measurement functions for High-NA EUV(2) resist wafers imaging to minimize resist damage and improve yield in mass production.
- As semiconductor device manufacturing processes evolve, research-and-development of N2 (2-nanometer generation node) and A14 (14-angstrom generation node) is underway.