Atomic layer deposition

Picosun Launches New PicoMEDICAL™ Solutions Specially Targeted for Healthcare Industries

Retrieved on: 
Tuesday, October 9, 2018
Industrial processes, Semiconductor device fabrication, Thin film deposition, Chemistry, Atomic layer deposition, Manufacturing, ALD, Polymers, Coatings, Thin film, Nanoparticle, Film coating

Picosun Group, a leading, global provider of ALD (Atomic Layer Deposition) thin film coating technology, strengthens its position in the healthcare market with new PicoMEDICAL solutions specially developed for the needs of medical device manufacturers.

Key Points: 
  • Picosun Group, a leading, global provider of ALD (Atomic Layer Deposition) thin film coating technology, strengthens its position in the healthcare market with new PicoMEDICAL solutions specially developed for the needs of medical device manufacturers.
  • ALD technology has the potential to disrupt the whole field of healthcare industries.
  • In pharmaceutical industries, Picosun's powder ALD technology is used to functionalize the surface of drug particles for controlled drug delivery.
  • As the leading AGILE ALD solutions provider, Picosun has now launched a product family specially targeted for medical industries.

Stress-free ALD From Picosun

Retrieved on: 
Tuesday, August 28, 2018
Thin film deposition, Semiconductor device fabrication, Atomic layer deposition, Chemistry, ALD, Manufacturing, Thin film, Supply chain management, Markku Leskelä, Atomic layer epitaxy

ESPOO, Finland, Aug. 28, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, reports a method to control and eliminate stress in ALD films.

Key Points: 
  • ESPOO, Finland, Aug. 28, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, reports a method to control and eliminate stress in ALD films.
  • Picosun has now developed a method with which zero stress and controlled stress ALD films can be produced.
  • Thanks to our unmatched ALD expertise, we have now developed a solution to one of the fundamental challenges in ALD.
  • Today, PICOSUN ALD equipment are in daily manufacturing use in numerous major industries around the world.

Stress-free ALD From Picosun

Retrieved on: 
Tuesday, August 28, 2018
Thin film deposition, Semiconductor device fabrication, Atomic layer deposition, Chemistry, ALD, Manufacturing, Thin film, Supply chain management, Markku Leskelä, Atomic layer epitaxy

ESPOO, Finland, Aug. 28, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, reports a method to control and eliminate stress in ALD films.

Key Points: 
  • ESPOO, Finland, Aug. 28, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating solutions, reports a method to control and eliminate stress in ALD films.
  • Picosun has now developed a method with which zero stress and controlled stress ALD films can be produced.
  • Thanks to our unmatched ALD expertise, we have now developed a solution to one of the fundamental challenges in ALD.
  • Today, PICOSUN ALD equipment are in daily manufacturing use in numerous major industries around the world.

Picosun's ALD Solutions Make Quality Watches Tick

Retrieved on: 
Thursday, July 26, 2018
Industrial processes, Coatings, Chemistry, ALD, Polymers, Thin film deposition, Thin film, Manufacturing, Film coating, Atomic layer deposition

It shows perfectly the flexibility and adaptability of the technology, and how several surface functionalities can be obtained with a single ALD coating.

Key Points: 
  • It shows perfectly the flexibility and adaptability of the technology, and how several surface functionalities can be obtained with a single ALD coating.
  • Also, the nanometer-scale tunability of the film thickness and the wide range of ALD materials create almost endless spectrum of colors to choose from.
  • As both color-tuning and surface protection can be attained with the same ALD film, material and process time savings are obtained.
  • Picosun provides the most advanced ALD thin film coating technology to enable the industrial leap into the future, with turn-key production solutions and unmatched expertise in the field.

Picosun's ALD Solutions Make Quality Watches Tick

Retrieved on: 
Thursday, July 26, 2018
Industrial processes, Coatings, Chemistry, ALD, Polymers, Thin film deposition, Thin film, Manufacturing, Film coating, Atomic layer deposition

It shows perfectly the flexibility and adaptability of the technology, and how several surface functionalities can be obtained with a single ALD coating.

Key Points: 
  • It shows perfectly the flexibility and adaptability of the technology, and how several surface functionalities can be obtained with a single ALD coating.
  • Also, the nanometer-scale tunability of the film thickness and the wide range of ALD materials create almost endless spectrum of colors to choose from.
  • As both color-tuning and surface protection can be attained with the same ALD film, material and process time savings are obtained.
  • Picosun provides the most advanced ALD thin film coating technology to enable the industrial leap into the future, with turn-key production solutions and unmatched expertise in the field.

Intermolecular Defines ALD Process for Efficient Composition Tuning of 3D Crosspoint NVM Selectors

Retrieved on: 
Tuesday, July 10, 2018
Chemistry, Non-volatile random-access memory, Computer memory, Emerging technologies, Computer data storage, Computing, Atomic layer deposition, Semiconductor device fabrication, Thin film deposition, Tellurium, Phase-change memory, Resistive random-access memory

SAN JOSE, Calif., July 10, 2018 /PRNewswire/ -- Intermolecular, Inc. (NASDAQ: IMI), the trusted partner for advanced materials innovation, today announced a new defined ALD (Atomic Layer Deposition) process of Tellurium (Te), allowing for more efficient composition tuning for 3D crosspoint NVM selectors.

Key Points: 
  • SAN JOSE, Calif., July 10, 2018 /PRNewswire/ -- Intermolecular, Inc. (NASDAQ: IMI), the trusted partner for advanced materials innovation, today announced a new defined ALD (Atomic Layer Deposition) process of Tellurium (Te), allowing for more efficient composition tuning for 3D crosspoint NVM selectors.
  • "Non-volatile memory (NVM) technologies such as resistive random access memory (RRAM) or phase change memory (PCM) has shown the potential in next generation data storage applications.
  • "With our defined process, for the first time, ALD of elemental tellurium can be used to tune the composition to realize vertically integrated 3D crosspoint memory."
  • Intermolecular has leveraged its accelerated High-Throughput Experimentation (HTE) platform to rapidly develop a conformal elemental Te ALD process to tune the composition in various OTS pertinent films.

Picosun Storms Over the Asian ALD Production Market in Several Key Application Areas

Retrieved on: 
Wednesday, June 27, 2018
Semiconductor device fabrication, Thin film deposition, Atomic layer deposition, Chemistry, ALD, Thin film, Manufacturing, Markku Leskelä

ESPOO, Finland, June 27, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, breaks through into industrial production in Asia in several new, key application areas.

Key Points: 
  • ESPOO, Finland, June 27, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, breaks through into industrial production in Asia in several new, key application areas.
  • The applications relate to display manufacturing and telecommunications, and a novel approach to use ALD to improve chip quality diagnostics.
  • "We are happy to take our ALD technology to yet new application areas where it creates new, disruptive solutions to our customers' key challenges.
  • Ltd.
    (*) In PICOSUN ALD systems, samples with ultra-high aspect ratios of over 1:2500 have been successfully coated.

Picosun Storms Over the Asian ALD Production Market in Several Key Application Areas

Retrieved on: 
Wednesday, June 27, 2018
Semiconductor device fabrication, Thin film deposition, Atomic layer deposition, Chemistry, ALD, Thin film, Manufacturing, Markku Leskelä

ESPOO, Finland, June 27, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, breaks through into industrial production in Asia in several new, key application areas.

Key Points: 
  • ESPOO, Finland, June 27, 2018 /PRNewswire/ -- Picosun Group, a leading supplier of advanced Atomic Layer Deposition (ALD) thin film coating technology, breaks through into industrial production in Asia in several new, key application areas.
  • The applications relate to display manufacturing and telecommunications, and a novel approach to use ALD to improve chip quality diagnostics.
  • "We are happy to take our ALD technology to yet new application areas where it creates new, disruptive solutions to our customers' key challenges.
  • Ltd.
    (*) In PICOSUN ALD systems, samples with ultra-high aspect ratios of over 1:2500 have been successfully coated.

Picosun Congratulates Dr. Tuomo Suntola on the Millennium Technology Prize 2018

Retrieved on: 
Tuesday, May 22, 2018
Thin film deposition, Tuomo Suntola, Semiconductor device fabrication, Atomic layer deposition, ALD, Tuomo, Millennium Technology Prize, Poutiainen, Science and technology, Culture, Innovation

ESPOO, Finland, May 22, 2018 /PRNewswire/ --Dr. Tuomo Suntola, the inventor of ALD and Picosun Board member, has received the Millennium Technology Prize 2018 .

Key Points: 
  • ESPOO, Finland, May 22, 2018 /PRNewswire/ --Dr. Tuomo Suntola, the inventor of ALD and Picosun Board member, has received the Millennium Technology Prize 2018 .
  • He saw the huge potential of atomic layer deposition and thin-film technology in microelectronics and information technology," says Pivi Trm, Chair of the Board of the Millennium Technology Prize Selection Committee.
  • Tuomo is an incredible innovator, who has definitely deserved this prize.
  • At Picosun, it is our obligation to Tuomo to keep spearheading the development of ALD, as an agile and innovation-driven company," says Poutiainen.

Picosun Congratulates Dr. Tuomo Suntola on the Millennium Technology Prize 2018

Retrieved on: 
Tuesday, May 22, 2018
Thin film deposition, Tuomo Suntola, Semiconductor device fabrication, Atomic layer deposition, ALD, Tuomo, Millennium Technology Prize, Poutiainen, Science and technology, Culture, Innovation

ESPOO, Finland, May 22, 2018 /PRNewswire/ --Dr. Tuomo Suntola, the inventor of ALD and Picosun Board member, has received the Millennium Technology Prize 2018 .

Key Points: 
  • ESPOO, Finland, May 22, 2018 /PRNewswire/ --Dr. Tuomo Suntola, the inventor of ALD and Picosun Board member, has received the Millennium Technology Prize 2018 .
  • He saw the huge potential of atomic layer deposition and thin-film technology in microelectronics and information technology," says Pivi Trm, Chair of the Board of the Millennium Technology Prize Selection Committee.
  • Tuomo is an incredible innovator, who has definitely deserved this prize.
  • At Picosun, it is our obligation to Tuomo to keep spearheading the development of ALD, as an agile and innovation-driven company," says Poutiainen.