Atomic layer deposition

Picosun's ALD Technology Helps to Fight Climate Change

Retrieved on: 
Thursday, January 30, 2020

By switching to Picosun's ALD nanolaminate barrier technology it is possible to obtain unmatched barrier performance with extremely thin, pinhole-free films.

Key Points: 
  • By switching to Picosun's ALD nanolaminate barrier technology it is possible to obtain unmatched barrier performance with extremely thin, pinhole-free films.
  • "We at Picosun want to employ our ALD technology for sustainable future.
  • Fighting the climate change by all possible means requires collaboration between the innovative industries and solution providers.
  • Picosun's ALD solutions enable technological leap into the future, with turn-key production processes and unmatched, pioneering expertise in the field - dating back to the invention of the technology itself.

Picosun's ALD Technology Enables 3D Silicon-integrated Microcapacitors With Unprecedented Performance

Retrieved on: 
Wednesday, January 8, 2020

ESPOO, Finland, Jan. 8, 2020 /PRNewswire/ -- Picosun Group, global provider of leading AGILE ALD (Atomic Layer Deposition) thin film coating solutions, reports record performance of silicon-integrated, three-dimensional deep trench microcapacitors manufactured using its ALD technology.

Key Points: 
  • ESPOO, Finland, Jan. 8, 2020 /PRNewswire/ -- Picosun Group, global provider of leading AGILE ALD (Atomic Layer Deposition) thin film coating solutions, reports record performance of silicon-integrated, three-dimensional deep trench microcapacitors manufactured using its ALD technology.
  • This calls for novel techniques to increase the performance and shrink the size of the energy storage unit as well.
  • Picosun's ALD technology has now realized unprecedented performance of these 3D microcapacitors.
  • "The suberb results achieved with our 3D silicon-integrated microcapacitors show again how imperative ALD technology is to modern microelectronics.

Picosun's ALD Technology Enables 3D Silicon-integrated Microcapacitors With Unprecedented Performance

Retrieved on: 
Wednesday, January 8, 2020

ESPOO, Finland, Jan. 8, 2020 /PRNewswire/ -- Picosun Group, global provider of leading AGILE ALD (Atomic Layer Deposition) thin film coating solutions, reports record performance of silicon-integrated, three-dimensional deep trench microcapacitors manufactured using its ALD technology.

Key Points: 
  • ESPOO, Finland, Jan. 8, 2020 /PRNewswire/ -- Picosun Group, global provider of leading AGILE ALD (Atomic Layer Deposition) thin film coating solutions, reports record performance of silicon-integrated, three-dimensional deep trench microcapacitors manufactured using its ALD technology.
  • This calls for novel techniques to increase the performance and shrink the size of the energy storage unit as well.
  • Picosun's ALD technology has now realized unprecedented performance of these 3D microcapacitors.
  • "The suberb results achieved with our 3D silicon-integrated microcapacitors show again how imperative ALD technology is to modern microelectronics.

High-performance Lithium-ion Battery Materials With Picosun ALD

Retrieved on: 
Tuesday, December 3, 2019

ESPOO, Finland, Dec. 3, 2019 /PRNewswire/ -- Picosun Group, the provider of AGILE ALD (Atomic Layer Deposition) thin film coating technology for global industries, reports excellent results achieved with ALD in the manufacturing of lithium ion thin film battery materials.

Key Points: 
  • ESPOO, Finland, Dec. 3, 2019 /PRNewswire/ -- Picosun Group, the provider of AGILE ALD (Atomic Layer Deposition) thin film coating technology for global industries, reports excellent results achieved with ALD in the manufacturing of lithium ion thin film battery materials.
  • Also, the ALD processes for several other anode materials such as SnO2, CoO, and MnO are well-known and thoroughly studied.
  • "We are very pleased with the PICOSUN ALD system at our facilities, and all the support and consultancy we have received from Picosun over the years.
  • With our ALD system we have been able to deposit dense, uniform ALD NiO films with low roughness and very high capacity.

High-performance Lithium-ion Battery Materials With Picosun ALD

Retrieved on: 
Tuesday, December 3, 2019

ESPOO, Finland, Dec. 3, 2019 /PRNewswire/ -- Picosun Group, the provider of AGILE ALD (Atomic Layer Deposition) thin film coating technology for global industries, reports excellent results achieved with ALD in the manufacturing of lithium ion thin film battery materials.

Key Points: 
  • ESPOO, Finland, Dec. 3, 2019 /PRNewswire/ -- Picosun Group, the provider of AGILE ALD (Atomic Layer Deposition) thin film coating technology for global industries, reports excellent results achieved with ALD in the manufacturing of lithium ion thin film battery materials.
  • Also, the ALD processes for several other anode materials such as SnO2, CoO, and MnO are well-known and thoroughly studied.
  • "We are very pleased with the PICOSUN ALD system at our facilities, and all the support and consultancy we have received from Picosun over the years.
  • With our ALD system we have been able to deposit dense, uniform ALD NiO films with low roughness and very high capacity.

Picosun Expands Selection of Biocompatible ALD Materials for Medical Applications

Retrieved on: 
Monday, November 4, 2019

ESPOO, Finland, Nov. 4, 2019 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, expands its selection of biocompatible ALD materials to be used in medical applications.

Key Points: 
  • ESPOO, Finland, Nov. 4, 2019 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, expands its selection of biocompatible ALD materials to be used in medical applications.
  • ALD, with its innate ability to create ultra-thin material layers with the highest conformality, uniformity, and structural quality, has enormous potential to solve various key issues in medical applications where implantable devices are involved.
  • Our patented know-how of ALD-based biocompatible protective encapsulation for implantable medical devices has already raised significant interest amongst industry leading companies.
  • We are pleased that we have now even wider portfolio of materials and solutions that we can provide to these companies.

Picosun Expands Selection of Biocompatible ALD Materials for Medical Applications

Retrieved on: 
Monday, November 4, 2019

ESPOO, Finland, Nov. 4, 2019 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, expands its selection of biocompatible ALD materials to be used in medical applications.

Key Points: 
  • ESPOO, Finland, Nov. 4, 2019 /PRNewswire/ -- Picosun Group, the leading supplier of AGILE ALD (Atomic Layer Deposition) thin film coating solutions for global industries, expands its selection of biocompatible ALD materials to be used in medical applications.
  • ALD, with its innate ability to create ultra-thin material layers with the highest conformality, uniformity, and structural quality, has enormous potential to solve various key issues in medical applications where implantable devices are involved.
  • Our patented know-how of ALD-based biocompatible protective encapsulation for implantable medical devices has already raised significant interest amongst industry leading companies.
  • We are pleased that we have now even wider portfolio of materials and solutions that we can provide to these companies.

Global High-K and ALD/CVD Metal Precursors (Interconnect, Capacitor, Gates) Market Size, Share & Trends Analysis Report 2019-2025 - ResearchAndMarkets.com

Retrieved on: 
Friday, August 16, 2019

The "High-k and ALD/CVD Metal Precursors Market Size, Share & Trends Analysis Report By Technology (Interconnect, Capacitor, Gates), By Region (North America, Europe, APAC, MEA, Latin America), And Segment Forecasts, 2019 - 2025" report has been added to ResearchAndMarkets.com's offering.

Key Points: 
  • The "High-k and ALD/CVD Metal Precursors Market Size, Share & Trends Analysis Report By Technology (Interconnect, Capacitor, Gates), By Region (North America, Europe, APAC, MEA, Latin America), And Segment Forecasts, 2019 - 2025" report has been added to ResearchAndMarkets.com's offering.
  • The global high-k and ALD/CVD metal precursors market size is projected to reach USD 789.8 million by 2025 expanding at a CAGR of 8.3% from 2019 to 2025.
  • The trend of miniaturization of semiconductor and electronic devices and the need for enhancing their performance are expected to drive the market.
  • Atomic Layer Deposition (ALD) is the subclass of the Chemical Vapor Deposition (CVD) process, which is used to manufacture thin films.

Barrier Films and Thin Film Encapsulation: IDTechEx Research Reviews Key Technology and Market Trends

Retrieved on: 
Monday, July 22, 2019

This overview is drawn from our report " Barrier Films and Thin Film Encapsulation for Flexible and/or Organic Electronics 2019-2029 ".

Key Points: 
  • This overview is drawn from our report " Barrier Films and Thin Film Encapsulation for Flexible and/or Organic Electronics 2019-2029 ".
  • There are trends to further evolve TFE technology too.Atomic layer deposition (ALD) is proposed as a superior deposition technology over PECVD.
  • To learn about this industry please consult our comprehensive report, " Barrier Films and Thin Film Encapsulation for Flexible and/or Organic Electronics 2019-2029 ".
  • IDTechEx guides your strategic business decisions through its Research, Consultancy and Event products, helping you profit from emerging technologies.

Picosun Launches a new ALD Product Platform for up to 200 mm Wafer Markets

Retrieved on: 
Tuesday, July 9, 2019

SAN FRANCISCO, July 9, 2019 /PRNewswire/ -- Picosun Group, the leading provider of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, has launched PICOSUN Morpher, a new ALD product platform designed to disrupt the up to 200 mm wafer markets in Beyond and More than Moore domains.

Key Points: 
  • SAN FRANCISCO, July 9, 2019 /PRNewswire/ -- Picosun Group, the leading provider of AGILE ALD (Atomic Layer Deposition) thin film coating solutions, has launched PICOSUN Morpher, a new ALD product platform designed to disrupt the up to 200 mm wafer markets in Beyond and More than Moore domains.
  • The PICOSUN Morpher ALD platform enables fast, cost-efficient, high volume production of e.g.
  • MEMS, sensors, LEDs, lasers, power electronics, optics, and 5G components with the leading process quality, reliability, and operational agility.
  • Today, PICOSUN ALD equipment are in daily manufacturing use in numerous major industries around the world.