Atomic layer deposition

Forge Nano sells Prometheus™ Powder ALD Equipment to Mitsui Kinzoku, Japan

Thursday, October 14, 2021 - 1:39pm

DENVER, Oct. 14, 2021 /PRNewswire/ -- Forge Nano, a Denver-based advanced materials equipment company, has sold Mitsui Mining & Smelting Co., Ltd. ("Mitsui Kinzoku") one of their flagship Prometheus powder ALD (PALD) systems.

Key Points: 
  • DENVER, Oct. 14, 2021 /PRNewswire/ -- Forge Nano, a Denver-based advanced materials equipment company, has sold Mitsui Mining & Smelting Co., Ltd. ("Mitsui Kinzoku") one of their flagship Prometheus powder ALD (PALD) systems.
  • Mitsui Kinzoku, an investor in Forge Nano, is using the Prometheus system to perform various proofs-of-concept and plans to use Forge Nano's commercial scale equipment for mass production.
  • With advanced powder fluidization aids and up to 8 ALD chemical precursor lines, Prometheus is the most capable powder ALD system on the market.
  • Forge Nano's team of ALD experts guide our customers through the entire process, making ALD feasible for nearly any industry.

Forge Nano Installs Prometheus™ Powder Atomic Layer Deposition (PALD) equipment at Air Liquide's Tokyo Innovation Campus

Friday, October 1, 2021 - 1:32pm

DENVER and YOKOSUKA, Japan, Oct. 1, 2021 /PRNewswire/ -- Forge Nano, a Denver-based advanced materials equipment company, has installed one of their flagship Prometheus powder ALD (PALD) systems at Air Liquide Japan Ltd.'s Tokyo Innovation Campus.

Key Points: 
  • DENVER and YOKOSUKA, Japan, Oct. 1, 2021 /PRNewswire/ -- Forge Nano, a Denver-based advanced materials equipment company, has installed one of their flagship Prometheus powder ALD (PALD) systems at Air Liquide Japan Ltd.'s Tokyo Innovation Campus.
  • Air Liquide, an investor in Forge Nano, is using the Prometheus system to perform various proofs-of-concept for subsequent scale-up at customer facilities using Forge Nano's commercial scale equipment.
  • "Forge Nano values Air Liquide as a key strategic investor and partner in various established markets.
  • Based in Denver, CO., Forge Nano is a global leader in surface engineering and precision nano-coating technology, using Atomic Layer Deposition.

Forge Nano and Mineral Commodities Enter Into MOU to Produce ALD-Coated Natural Graphite Anode Powders

Thursday, August 19, 2021 - 1:38pm

Forge Nano's surface engineering platform technology will be used to apply atomic level coatings to Mineral Commodities' natural graphite materials.

Key Points: 
  • Forge Nano's surface engineering platform technology will be used to apply atomic level coatings to Mineral Commodities' natural graphite materials.
  • Dr. Surinder Ghag, MRC's Chief Technology Officer, explains: "By combining our high-quality natural graphite with Forge Nano's ALD coating technology, we can produce a high-performing, cost-competitive graphite anode powder for lithium-ion batteries.
  • Paul Lichty, Forge Nano's Chief Executive Officer,adds: "We are excited to be fully supporting Mineral Commodities as a key technology partner in their path towards large-scale anode powder production.
  • MRC's Graphite vision is to be a supplier of high quality, low emission, sustainably manufactured, natural graphite active anode material to meet the fast-growing demand for sustainably manufactured lithium-ion batteries.

Picosun delivers ALD technology to ams OSRAM

Wednesday, July 28, 2021 - 3:46am

ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.

Key Points: 
  • ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.
  • Picosun Group and ams OSRAM have collaborated in a public funded project FLINGO (m-era.net project) to develop new ALD materials and processes to improve the characteristics of LEDs, such as efficiency and durability.
  • We are very excited to have the PICOSUN Morpher F cluster platform installed in our cleanroom", states Dr. Sebastian Taeger, at ams OSRAM.
  • Join OSRAM social media channels: > Twitter > LinkedIn > Facebook > YouTube
    Please note: The ams brand is owned by ams AG, the OSRAM brand is owned by OSRAM GmbH.

Picosun delivers ALD technology to ams OSRAM

Wednesday, July 28, 2021 - 3:45am

ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.

Key Points: 
  • ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.
  • Picosun Group and ams OSRAM have collaborated in a public funded project FLINGO (m-era.net project) to develop new ALD materials and processes to improve the characteristics of LEDs, such as efficiency and durability.
  • We are very excited to have the PICOSUN Morpher F cluster platform installed in our cleanroom", states Dr. Sebastian Taeger, at ams OSRAM.
  • Join OSRAM social media channels: > Twitter > LinkedIn > Facebook > YouTube
    Please note: The ams brand is owned by ams AG, the OSRAM brand is owned by OSRAM GmbH.

Picosun's PicoArmourTM reduces semiconductor manufacturing costs

Wednesday, June 2, 2021 - 3:53am

With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.

Key Points: 
  • With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.
  • Compared to only using Y2O3, PicoArmourTM enables an up to five times faster and a more cost-effective way of producing the coating.
  • * Also, the maintenance interval of etch tools can be increased which also translates to significant reduction of manufacturing costs.
  • "Picosun's approach with PicoArmourTM is to combine the highly-etch-resistant Y2O3 ALD process with more robust ALD processes.

Picosun's PicoArmourTM reduces semiconductor manufacturing costs

Wednesday, June 2, 2021 - 3:52am

With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.

Key Points: 
  • With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.
  • Compared to only using Y2O3, PicoArmourTM enables an up to five times faster and a more cost-effective way of producing the coating.
  • * Also, the maintenance interval of etch tools can be increased which also translates to significant reduction of manufacturing costs.
  • "Picosun's approach with PicoArmourTM is to combine the highly-etch-resistant Y2O3 ALD process with more robust ALD processes.

The Coretec Group’s Dr. Ramez Elgammal Is Selected to Present at ALD/ALE 2021

Monday, May 24, 2021 - 1:45pm

The Coretec Group, Inc., (OTCQB: CRTG) (the Company) is proud to announce that Dr. Ramez Elgammal, Vice President of Technology at The Coretec Group, has been selected to present at the AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) taking place next month.

Key Points: 
  • The Coretec Group, Inc., (OTCQB: CRTG) (the Company) is proud to announce that Dr. Ramez Elgammal, Vice President of Technology at The Coretec Group, has been selected to present at the AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) taking place next month.
  • Dr. Elgammals abstract was accepted because of his exceptional knowledge in innovative ways of producing high purity silicon films at low temperatures using engineered silicon molecules.
  • The Coretec Group serves the global technology markets in energy, electronics, semiconductor, solar, health, environment, and security.
  • Such risks and uncertainties are described in greater detail in our filings with the U.S. Securities and Exchange Commission.

PICOSUN® Sprinter demonstrates record-breaking batch film quality

Wednesday, May 19, 2021 - 3:54am

b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.

Key Points: 
  • b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.
  • SiO2 thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications.
  • Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN Sprinter.\n"Picosun Group launched Sprinter, the fast batch ALD tool for 300 mm wafers, in December 2020.
  • We wanted to bring single wafer film quality and uniformity for fast batch processing and meet the challenges in high volume ALD manufacturing.

PICOSUN® Sprinter demonstrates record-breaking batch film quality

Wednesday, May 19, 2021 - 3:52am

b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.

Key Points: 
  • b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.
  • SiO2 thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications.
  • Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN Sprinter.\n"Picosun Group launched Sprinter, the fast batch ALD tool for 300 mm wafers, in December 2020.
  • We wanted to bring single wafer film quality and uniformity for fast batch processing and meet the challenges in high volume ALD manufacturing.