Atomic layer deposition

Forge Nano and Mineral Commodities Enter Into MOU to Produce ALD-Coated Natural Graphite Anode Powders

Retrieved on: 
Thursday, August 19, 2021
Company, Graphite, Air Liquide, Engineering, Acquisition, MRC, Mineral, Carbon, Temperature, Volkswagen, Partnership, ALD, Powder, Atomic layer deposition, Technology, Sintering, Aluminium, Lithium

Forge Nano's surface engineering platform technology will be used to apply atomic level coatings to Mineral Commodities' natural graphite materials.

Key Points: 
  • Forge Nano's surface engineering platform technology will be used to apply atomic level coatings to Mineral Commodities' natural graphite materials.
  • Dr. Surinder Ghag, MRC's Chief Technology Officer, explains: "By combining our high-quality natural graphite with Forge Nano's ALD coating technology, we can produce a high-performing, cost-competitive graphite anode powder for lithium-ion batteries.
  • Paul Lichty, Forge Nano's Chief Executive Officer,adds: "We are excited to be fully supporting Mineral Commodities as a key technology partner in their path towards large-scale anode powder production.
  • MRC's Graphite vision is to be a supplier of high quality, low emission, sustainably manufactured, natural graphite active anode material to meet the fast-growing demand for sustainably manufactured lithium-ion batteries.

Picosun delivers ALD technology to ams OSRAM

Retrieved on: 
Wednesday, July 28, 2021
Osram, ams AG, Companies, Industry economics), Industrial processes, Atomic layer deposition, Light-emitting diode, AMS, Osram Opto Semiconductors GmbH

ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.

Key Points: 
  • ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.
  • Picosun Group and ams OSRAM have collaborated in a public funded project FLINGO (m-era.net project) to develop new ALD materials and processes to improve the characteristics of LEDs, such as efficiency and durability.
  • We are very excited to have the PICOSUN Morpher F cluster platform installed in our cleanroom", states Dr. Sebastian Taeger, at ams OSRAM.
  • Join OSRAM social media channels: > Twitter > LinkedIn > Facebook > YouTube
    Please note: The ams brand is owned by ams AG, the OSRAM brand is owned by OSRAM GmbH.

Picosun delivers ALD technology to ams OSRAM

Retrieved on: 
Wednesday, July 28, 2021
Osram, ams AG, Companies, Industry economics), Industrial processes, Atomic layer deposition, Light-emitting diode, AMS, Osram Opto Semiconductors GmbH

ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.

Key Points: 
  • ESPOO, Finland, July 28, 2021 /PRNewswire/ -- Picosun Group delivers cutting-edge Atomic Layer Deposition (ALD) technology to ams OSRAM for volume manufacturing of optical semiconductor devices.
  • Picosun Group and ams OSRAM have collaborated in a public funded project FLINGO (m-era.net project) to develop new ALD materials and processes to improve the characteristics of LEDs, such as efficiency and durability.
  • We are very excited to have the PICOSUN Morpher F cluster platform installed in our cleanroom", states Dr. Sebastian Taeger, at ams OSRAM.
  • Join OSRAM social media channels: > Twitter > LinkedIn > Facebook > YouTube
    Please note: The ams brand is owned by ams AG, the OSRAM brand is owned by OSRAM GmbH.

Picosun's PicoArmourTM reduces semiconductor manufacturing costs

Retrieved on: 
Wednesday, June 2, 2021
Physical sciences, Chemistry, Natural sciences, Corrosion, Metallurgy, Coating, Semiconductor device fabrication, Atomic layer deposition

With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.

Key Points: 
  • With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.
  • Compared to only using Y2O3, PicoArmourTM enables an up to five times faster and a more cost-effective way of producing the coating.
  • * Also, the maintenance interval of etch tools can be increased which also translates to significant reduction of manufacturing costs.
  • "Picosun's approach with PicoArmourTM is to combine the highly-etch-resistant Y2O3 ALD process with more robust ALD processes.

Picosun's PicoArmourTM reduces semiconductor manufacturing costs

Retrieved on: 
Wednesday, June 2, 2021
Physical sciences, Chemistry, Natural sciences, Corrosion, Metallurgy, Coating, Semiconductor device fabrication, Atomic layer deposition

With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.

Key Points: 
  • With PicoArmourTM the corrosion protection can be achieved more efficiently compared with the industry solutions commonly used today.
  • Compared to only using Y2O3, PicoArmourTM enables an up to five times faster and a more cost-effective way of producing the coating.
  • * Also, the maintenance interval of etch tools can be increased which also translates to significant reduction of manufacturing costs.
  • "Picosun's approach with PicoArmourTM is to combine the highly-etch-resistant Y2O3 ALD process with more robust ALD processes.

The Coretec Group’s Dr. Ramez Elgammal Is Selected to Present at ALD/ALE 2021

Retrieved on: 
Monday, May 24, 2021
Other Energy, Nanotechnology, Hardware, Alternative energy, Energy, Consumer electronics, Technology, Semiconductor, Semiconductor device fabrication, Chemistry, Physical sciences, Natural sciences, Thin film deposition, Industrial processes, Atomic layer etching, Etching, Atomic layer deposition, Silicon, ALD

The Coretec Group, Inc., (OTCQB: CRTG) (the Company) is proud to announce that Dr. Ramez Elgammal, Vice President of Technology at The Coretec Group, has been selected to present at the AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) taking place next month.

Key Points: 
  • The Coretec Group, Inc., (OTCQB: CRTG) (the Company) is proud to announce that Dr. Ramez Elgammal, Vice President of Technology at The Coretec Group, has been selected to present at the AVS 21st International Conference on Atomic Layer Deposition (ALD 2021) featuring the 8th International Atomic Layer Etching Workshop (ALE 2021) taking place next month.
  • Dr. Elgammals abstract was accepted because of his exceptional knowledge in innovative ways of producing high purity silicon films at low temperatures using engineered silicon molecules.
  • The Coretec Group serves the global technology markets in energy, electronics, semiconductor, solar, health, environment, and security.
  • Such risks and uncertainties are described in greater detail in our filings with the U.S. Securities and Exchange Commission.

PICOSUN® Sprinter demonstrates record-breaking batch film quality

Retrieved on: 
Wednesday, May 19, 2021
Semiconductor device fabrication, Industrial processes, Thin film deposition, Physical sciences, Chemistry, ALD, Thin film, Solar cells, Atomic layer deposition

b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.

Key Points: 
  • b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.
  • SiO2 thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications.
  • Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN Sprinter.\n"Picosun Group launched Sprinter, the fast batch ALD tool for 300 mm wafers, in December 2020.
  • We wanted to bring single wafer film quality and uniformity for fast batch processing and meet the challenges in high volume ALD manufacturing.

PICOSUN® Sprinter demonstrates record-breaking batch film quality

Retrieved on: 
Wednesday, May 19, 2021
Semiconductor device fabrication, Industrial processes, Thin film deposition, Physical sciences, Chemistry, ALD, Thin film, Solar cells, Atomic layer deposition

b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.

Key Points: 
  • b'ESPOO, Finland, May 19, 2021 /PRNewswire/ -- Picosun Group has further optimized its PICOSUN Sprinter ALD system processes successfully for semiconductor, display and IoT component manufacturing lines.\nPICOSUN Sprinter ALD system Al2O3 process results showed excellent thickness uniformity even at low 90 C deposition temperature.
  • SiO2 thin film is widely used in the manufacturing process of for example logic chips as spacer or multipattern applications.
  • Sensitive substrates can require low deposition temperature or low thermal budget without compromising the film quality, which is one of the challenges the company wanted to address with PICOSUN Sprinter.\n"Picosun Group launched Sprinter, the fast batch ALD tool for 300 mm wafers, in December 2020.
  • We wanted to bring single wafer film quality and uniformity for fast batch processing and meet the challenges in high volume ALD manufacturing.

Global Atomic Layer Deposition (ALD) Market Report 2021: Market to Reach $3.5 Billion by 2027 - U.S. Market is Estimated at $493.5 Million, While China is Forecast to Grow at 10.8% CAGR - ResearchAndMarkets.com

Retrieved on: 
Wednesday, April 7, 2021
Chemicals, Plastics, Manufacturing, Atomic layer deposition, Semiconductor device fabrication, Thin film deposition, Compound annual growth rate, Academic disciplines, Economy

Aluminum Oxide, one of the segments analyzed in the report, is projected to record a 11% CAGR and reach US$1.2 Billion by the end of the analysis period.

Key Points: 
  • Aluminum Oxide, one of the segments analyzed in the report, is projected to record a 11% CAGR and reach US$1.2 Billion by the end of the analysis period.
  • The U.S. Market is Estimated at $493.5 Million, While China is Forecast to Grow at 10.8% CAGR
    The Atomic Layer Deposition (ALD) market in the U.S. is estimated at US$493.5 Million in the year 2020.
  • In the global Plasma Enhanced segment, USA, Canada, Japan, China and Europe will drive the 12.2% CAGR estimated for this segment.
  • Led by countries such as Australia, India, and South Korea, the market in Asia-Pacific is forecast to reach US$415.9 Million by the year 2027.

Better Li-ion Batteries with Forge Nano's Atomic Layer Coatings

Retrieved on: 
Thursday, March 18, 2021
Thin film deposition, Industrial processes, Semiconductor device fabrication, Physical sciences, Materials science, Chemistry, Atomic layer deposition, ALD, Coating

Forge Nano's proprietary ALD technology can be used to apply atomic scale coatings, designed to optimize the performance of anode materials.

Key Points: 
  • Forge Nano's proprietary ALD technology can be used to apply atomic scale coatings, designed to optimize the performance of anode materials.
  • We are excited to pair our proven ALD coating technology, with such high-quality materials to make better and more reliable batteries."
  • From energy storage materials to pharmaceutical research, Forge Nano's Atomic Layer Deposition platform makes products better from the atoms up.
  • Based in Denver, CO., Forge Nano is a global leader in surface engineering and precision nano-coating technology, using Atomic Layer Deposition.