Photomask

Global Photomask Inspection Market 2020, Segmented by Technology and Geography

Retrieved on: 
Wednesday, May 13, 2020
Companies, Photomask, Photronics Inc, Mask inspection, Market research, ASML Holding, KLA Corporation, Thermo Fisher Scientific

This study identifies the transition to large-diameter wafers as one of the prime reasons driving the photomask inspection market growth during the next few years.

Key Points: 
  • This study identifies the transition to large-diameter wafers as one of the prime reasons driving the photomask inspection market growth during the next few years.
  • The photomask inspection market covers the following areas:
    This robust vendor analysis is designed to help clients improve their market position, and in line with this, this report provides a detailed analysis of several leading photomask inspection market vendors that include Applied Materials Inc., ASML Holding NV, Hitachi Ltd., JEOL Ltd., KLA Corp., Lasertec Corp., Onto Innovation Inc., Photronics Inc., Thermo Fisher Scientific Inc., and Carl Zeiss AG.
  • Also, the photomask inspection market analysis report includes information on upcoming trends and challenges that will influence market growth.
  • This market research report provide a complete competitive landscape and an in-depth vendor selection methodology and analysis using qualitative and quantitative research to forecast an accurate market growth.

Global Photomask Inspection Market Forecast to Grow by $318.21 Million during 2020-2024, at a CAGR of 8% During the Forecast Period - ResearchAndMarkets.com

Retrieved on: 
Monday, May 11, 2020
Electronic design automation, Consumer electronics, Technology, Photography, Other Technology, Hardware, Photomask, Wafer, Market research, Market analysis

This study identifies the transition to large-diameter wafers as one of the prime reasons driving the photomask inspection market growth during the next few years.

Key Points: 
  • This study identifies the transition to large-diameter wafers as one of the prime reasons driving the photomask inspection market growth during the next few years.
  • Also, an increasing focus on larger diameter wafer size, decrease in lithography wavelength, and increasing demand for ASICs will lead to sizable demand in the market.
  • Also, the photomask inspection market analysis report includes information on upcoming trends and challenges that will influence market growth.
  • This market research report provide a complete competitive landscape and an in-depth vendor selection methodology and analysis using qualitative and quantitative research to forecast an accurate market growth.

Global $4.97 Billion Photomask Market (2019 to 2026) - Key Players Include Applied Materials, Photronics & LG Innotek Among Others - ResearchAndMarkets.com

Retrieved on: 
Wednesday, March 18, 2020
Photography, Technology, Semiconductor, Microtechnology, Technology, Photomask, Materials science, Articles, Microelectromechanical systems, Integrated circuit, Resist, Draft:Maskless aligner

According to the report the global photomask market size was valued at $4.00 billion in 2018, and is projected to reach $4.97 billion by 2026, growing at a CAGR of 2.5% from 2019 to 2026.

Key Points: 
  • According to the report the global photomask market size was valued at $4.00 billion in 2018, and is projected to reach $4.97 billion by 2026, growing at a CAGR of 2.5% from 2019 to 2026.
  • Photomask is a procedure of using lithography techniques to transfer display patterns and circuits onto semiconductors, microelectromechanical systems, and displays.
  • Photomask contains the pattern of integrated circuits, and they have become smaller and more complex to accurately transfer the pattern to silicon wafer.
  • The display segment is expected to dominate the global photomask market during forecast period.

Photronics Reports First Quarter Fiscal 2020 Results

Retrieved on: 
Wednesday, March 4, 2020
PLAB, Photronics Inc, Photomask, Brookfield, Connecticut

First quarter 2020 revenue of $159.7 million was a record, up 2% sequentially and 28% year-over-year

Key Points: 
  • First quarter 2020 revenue of $159.7 million was a record, up 2% sequentially and 28% year-over-year
    Net income attributable to Photronics, Inc. shareholders was $10.3 million, or $0.16 per diluted share
    Cash provided by operating activities was $30.8 million, resulting in a cash balance of $218.3 million
    BROOKFIELD, Conn., March 04, 2020 (GLOBE NEWSWIRE) -- Photronics, Inc. (NASDAQ:PLAB), a worldwide leader in photomask technologies and solutions, today reported financial results for its fiscal 2020 first quarter ended February 2, 2020.
  • First quarter revenue was a record $159.7 million, 2% better than the previous quarter and 28% better than the same quarter last year.
  • For the second quarter of 2020, Photronics expects revenue to be between $145 million and $155 million, and net income attributable to Photronics, Inc. shareholders to be between $0.11 and $0.17 per diluted share.
  • A conference call to discuss these results is scheduled for 8:30 a.m. Eastern time on Wednesday, March 4, 2020.

EUV Tech, Inc. Completes Development of Next Generation Mask Defect Review Tool

Retrieved on: 
Monday, February 24, 2020
Extreme ultraviolet, Electrodynamics, Radiation, Extreme ultraviolet lithography, Photomask, Ultraviolet, Dynamical systems

MARTINEZ, Calif., Feb. 24, 2020 /PRNewswire-PRWeb/ --Bay Area-based EUV Tech, Inc. has taken the next major step in Extreme Ultraviolet (EUV) Lithography by completing development on the AIRES EUV mask defect review tool.

Key Points: 
  • MARTINEZ, Calif., Feb. 24, 2020 /PRNewswire-PRWeb/ --Bay Area-based EUV Tech, Inc. has taken the next major step in Extreme Ultraviolet (EUV) Lithography by completing development on the AIRES EUV mask defect review tool.
  • EUV mirrors housed within a chip manufacturing tool then shrink that design down to mere nanometers which eventually translates into more microchip processing power.
  • AIRES (Actinic Image REview System) can be used for defect printability review of EUV photomasks by capturing real-world mask defects.
  • EUV Tech's broad range of equipment includes EUV Reflectometers, EUV Pellicle Transmission Tools, and EUV Accelerated Exposure tools.

Photronics to Report First Quarter Earnings

Retrieved on: 
Wednesday, February 12, 2020
Photronics Inc, Photomask, Integrated circuit, FPD, Conference call, Electronics, Information and communications technology, Technology

Photronics will host a public conference call the same day at 8:30 a.m. Eastern time.

Key Points: 
  • Photronics will host a public conference call the same day at 8:30 a.m. Eastern time.
  • The call will be broadcast live and on-demand on the "Investor" section of the Photronics website at www.photronics.com .
  • Photronics is a leading worldwide manufacturer of integrated circuit (IC) and flat panel display (FPD) photomasks .
  • Founded in 1969, Photronics has been a trusted photomask supplier for over 50 years.

Mask Inspection Equipment Market Analysis & Outlook During the Forecast Period, 2020-2024 - ResearchAndMarkets.com

Retrieved on: 
Wednesday, January 8, 2020
Other Manufacturing, Manufacturing, Electromagnetic radiation, Electrodynamics, Radiation, Physical sciences, Mask shop, Actinism, Mask inspection, Ultraviolet, Inspection, Photomask

The "Mask Inspection Equipment Market by Technology, End-user, and Geography - Forecast and Analysis 2020-2024" report has been added to ResearchAndMarkets.com's offering.

Key Points: 
  • The "Mask Inspection Equipment Market by Technology, End-user, and Geography - Forecast and Analysis 2020-2024" report has been added to ResearchAndMarkets.com's offering.
  • Global Mask Inspection Equipment Market: About this market
    The mask inspection equipment market analysis considers sales from captive mask shops and merchant mask shop end-users.
  • However, cyclic nature of semiconductor industry, growing demand for refurbished and used mask inspection equipment, and high dependence on a small group of customers may hamper the growth of the mask inspection equipment industry over the forecast period.
  • Thus, market players are engaging in R&D initiatives for developing an EUV mask blank inspection system integrated with the Actinic Blank Inspection (ABI) technology for creating actinic patterned mask inspection equipment.

Photronics to Present at the 22nd Annual Needham Growth Conference in NYC

Retrieved on: 
Wednesday, January 8, 2020
Photronics Inc, PLAB, Photomask, Brookfield, Connecticut, GlobeNewswire, Brookfield

BROOKFIELD, Conn., Jan. 08, 2020 (GLOBE NEWSWIRE) -- Photronics, Inc. (Nasdaq:PLAB), a worldwide leader in photomask technologies and solutions, is scheduled to present at the 22nd Annual Needham Growth Conference on Wednesday, January 15, 2020 at 12:50 p.m. Eastern Time at the Lotte New York Palace Hotel in New York City.

Key Points: 
  • BROOKFIELD, Conn., Jan. 08, 2020 (GLOBE NEWSWIRE) -- Photronics, Inc. (Nasdaq:PLAB), a worldwide leader in photomask technologies and solutions, is scheduled to present at the 22nd Annual Needham Growth Conference on Wednesday, January 15, 2020 at 12:50 p.m. Eastern Time at the Lotte New York Palace Hotel in New York City.
  • A live and on-demand webcast of the presentation can be accessed on the Investors section of the Photronics website at www.photronics.com .
  • Photronics is a leading worldwide manufacturer of integrated circuit (IC) and flat panel display (FPD) photomasks .
  • Founded in 1969, Photronics has been a trusted photomask supplier for over 50 years.

Mycronic Receives Order for an Advanced Mask Writer and a Measurement System

Retrieved on: 
Thursday, December 19, 2019
Photomask

STOCKHOLM, Dec. 19, 2019 /PRNewswire/ -- Mycronic AB (publ) has received an order for a Prexision 800 Evo mask writer for display applications and a Prexision MMS measurement system for quality assurance of advanced photomasks.

Key Points: 
  • STOCKHOLM, Dec. 19, 2019 /PRNewswire/ -- Mycronic AB (publ) has received an order for a Prexision 800 Evo mask writer for display applications and a Prexision MMS measurement system for quality assurance of advanced photomasks.
  • In addition, Mycronic recently launched SLX, a new laser mask writer for the semiconductor industry.
  • "It is gratifying to receive the third order for a Prexision 800 Evo, Mycronic's most advanced mask writer, together with an order for a Prexision MMS.
  • This gives the customer access to the combination of Prexision writer and Prexision metrology system which has become industry standard for producing the most advanced photomasks," says Charlott Samuelsson, Sr VP Pattern Generators at Mycronic.

Mycronic Receives Order for an Advanced Mask Writer and a Measurement System

Retrieved on: 
Thursday, December 19, 2019
Photomask

STOCKHOLM, Dec. 19, 2019 /PRNewswire/ -- Mycronic AB (publ) has received an order for a Prexision 800 Evo mask writer for display applications and a Prexision MMS measurement system for quality assurance of advanced photomasks.

Key Points: 
  • STOCKHOLM, Dec. 19, 2019 /PRNewswire/ -- Mycronic AB (publ) has received an order for a Prexision 800 Evo mask writer for display applications and a Prexision MMS measurement system for quality assurance of advanced photomasks.
  • In addition, Mycronic recently launched SLX, a new laser mask writer for the semiconductor industry.
  • "It is gratifying to receive the third order for a Prexision 800 Evo, Mycronic's most advanced mask writer, together with an order for a Prexision MMS.
  • This gives the customer access to the combination of Prexision writer and Prexision metrology system which has become industry standard for producing the most advanced photomasks," says Charlott Samuelsson, Sr VP Pattern Generators at Mycronic.