Photomask

Asian Customer to Upgrade Prexision System

Retrieved on: 
Monday, October 1, 2018

STOCKHOLM, Oct. 1, 2018 /PRNewswire/ -- Mycronic has landed an order to upgrade a system to a full-scale Prexision-10 with expanded functionality.

Key Points: 
  • STOCKHOLM, Oct. 1, 2018 /PRNewswire/ -- Mycronic has landed an order to upgrade a system to a full-scale Prexision-10 with expanded functionality.
  • The upgrade will be implemented on a previously ordered Prexision-10 which was limited to production of G6/G8 photomasks.
  • The implementation of the upgrade is planned to take place in the first quarter of 2019.
  • "Through this upgrade, the customer gains the capacity to meet increasing requirements for advanced photomasks for Generation 10," says Charlott Samuelsson, Sr VP Business Area Pattern Generators, Mycronic.

Asian Customer to Upgrade Prexision System

Retrieved on: 
Monday, October 1, 2018

STOCKHOLM, Oct. 1, 2018 /PRNewswire/ -- Mycronic has landed an order to upgrade a system to a full-scale Prexision-10 with expanded functionality.

Key Points: 
  • STOCKHOLM, Oct. 1, 2018 /PRNewswire/ -- Mycronic has landed an order to upgrade a system to a full-scale Prexision-10 with expanded functionality.
  • The upgrade will be implemented on a previously ordered Prexision-10 which was limited to production of G6/G8 photomasks.
  • The implementation of the upgrade is planned to take place in the first quarter of 2019.
  • "Through this upgrade, the customer gains the capacity to meet increasing requirements for advanced photomasks for Generation 10," says Charlott Samuelsson, Sr VP Business Area Pattern Generators, Mycronic.

Rigaku Innovative Technologies Presents High Performance Thin Film Coatings and Optics at SPIE Photomask Technology + EUV Lithography 2018

Retrieved on: 
Monday, September 17, 2018

MONTEREY, Calif., Sept. 17, 2018 /PRNewswire-PRWeb/ -- Rigaku Innovative Technologies ( RIT ), a leading global supplier of multilayer optics for EUV lithography ( EUVL ), is pleased to announce its attendance at the SPIE Photomask Technology + EUV Lithography 2018 meeting in Monterey, California.

Key Points: 
  • MONTEREY, Calif., Sept. 17, 2018 /PRNewswire-PRWeb/ -- Rigaku Innovative Technologies ( RIT ), a leading global supplier of multilayer optics for EUV lithography ( EUVL ), is pleased to announce its attendance at the SPIE Photomask Technology + EUV Lithography 2018 meeting in Monterey, California.
  • The event takes place, Monday, September 17 through Thursday, September 20, 2018 at the Monterey Conference Center and Monterey Marriott in Monterey, California.
  • RIT is presenting its high-reflectivity and precision coatings for collector, illumination, imaging and analysis optics for EUV lithography at booth 410.
  • Since 1993, RIT has been a global leader in the development and supply of EUV optics, thus shaping the vision of EUVL for high-volume manufacturing.

Rigaku Innovative Technologies Presents High Performance Thin Film Coatings and Optics at 2018 SPIE Photomask Technology Conference

Retrieved on: 
Tuesday, August 21, 2018

SAN DIEGO, Aug. 21, 2018 /PRNewswire-PRWeb/ --Rigaku Innovative Technologies ( RIT ), a leading global supplier of multilayer optics for coatings is pleased to announce its attendance at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2018 meeting in San Diego, California.

Key Points: 
  • SAN DIEGO, Aug. 21, 2018 /PRNewswire-PRWeb/ --Rigaku Innovative Technologies ( RIT ), a leading global supplier of multilayer optics for coatings is pleased to announce its attendance at the SPIE Photomask Technology + Extreme Ultraviolet Lithography 2018 meeting in San Diego, California.
  • The event takes place, Tuesday, August 21 through Thursday, August 23, 2018 at the .at the San Diego Convention Center.
  • As the components division of Rigaku Corporation, RIT is a global supplier of high-performance multilayer optics used in commercial and academic institutions and government research facilities.
  • RIT also offers single film, multilayer and crystal optics for synchrotron beamlines and end-stations.