ACM Research Launches New Furnace Tool for Thermal Atomic Layer Deposition to Support Advanced Semiconductor Manufacturing Requirements
The Ultra Fn A system adds thermal atomic layer deposition (ALD) to ACMs extensive list of supported furnace applications.
- The Ultra Fn A system adds thermal atomic layer deposition (ALD) to ACMs extensive list of supported furnace applications.
- The company also announced that it has shipped the first Ultra Fn A furnace tool to a top-tier China-based foundry manufacturer.
- Our new ALD tool builds on our extensive furnace platform, which also includes support for atmospheric, low-pressure and ultra-high vacuum furnace options.
- The Ultra Fn A furnace tool was designed from the ground-up to meet best-in-class requirements for high-throughput batch ALD processing.