LER

New VOYAGER PAD Analyses Reinforce Benefit of XARELTO® (rivaroxaban) Plus Aspirin Across High-Risk and Complex Patient Populations with Peripheral Artery Disease (PAD)

Retrieved on: 
Tuesday, November 14, 2023

TITUSVILLE, N.J., Nov. 14, 2023 /PRNewswire/ -- The Janssen Pharmaceutical Companies of Johnson & Johnson today announced data from two new analyses from the Phase 3 VOYAGER PAD clinical trial reinforcing the benefit of XARELTO® (rivaroxaban [2.5 mg twice daily plus aspirin 100 mg once daily]) over standard of care (aspirin alone). Data from the two analyses demonstrate the role of XARELTO® in treating both high-risk and fragile patients and those with and without comorbid coronary artery diseases (CAD). Results were presented at the American Heart Association's (AHA) 2023 Scientific Sessions, hosted in Philadelphia, Pennsylvania, November 11-13, 2023.

Key Points: 
  • "These analyses reinforce the consistency of the favorable benefit-risk profile of XARELTO® plus aspirin for patients with vascular disease, regardless of comorbidity.
  • In fragile patients treated with XARELTO® plus aspirin, 6.2% of patients experienced a MALE compared to 10.3% of patients treated with placebo.
  • In patients with PAD only, 11% of patients treated with XARELTO® plus aspirin experienced a MACE versus 9.8% of patients treated with placebo.
  • Overall, the safety of XARELTO® plus aspirin in patients with PAD was consistent regardless of CAD with no significant interactions.

Fractilia Adds Overlay Metrology Capability to Stochastics Control Solutions to Further Improve EUV Patterning Control and Yields

Retrieved on: 
Monday, June 12, 2023

AUSTIN, Texas, June 12, 2023 /PRNewswire/ --Fractilia, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today introduced the Fractilia Overlay Package, an optional offering that adds critical new overlay measurement and analysis capabilities to Fractilia's MetroLER™ and FAME™ products. Fractilia's products, which combine the company's patented Fractilia Inverse Linescan Model (FILM™) technology with true computational metrology, are the only proven fab solutions that provide highly accurate and precise measurements of all major stochastic effects – the single largest source of patterning errors at advanced nodes. Fractilia is currently engaged with multiple leading chip manufacturers in analyzing their SEM-based overlay data with the new Fractilia Overlay Package.

Key Points: 
  • Fractilia is currently engaged with multiple leading chip manufacturers in analyzing their SEM-based overlay data with the new Fractilia Overlay Package.
  • Optical-based metrology tools have traditionally been used by chip manufacturers to measure and control this pattern overlay, which is essential to producing high-yielding and high-performing semiconductor devices.
  • In addition, by combining SEM stochastics measurements with optical overlay measurements through our Fractilia Overlay Package, we believe that we not only can improve SEM overlay metrology accuracy, but also provide better lot dispositioning and correctables, which in turn can improve patterning control and reduce non-zero offset (NZO) or its variability."
  • With the new Fractilia Overlay Package, Fractilia adds highly accurate SEM-based overlay measurements, including their stochastic properties, on top of its existing measurement capabilities.

Fractilia Brings Stochastics Metrology to HVM Fabs to Improve EUV Patterning Control and Yields

Retrieved on: 
Tuesday, February 21, 2023

AUSTIN, Texas, Feb. 21, 2023 /PRNewswire/ --Fractilia, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today announced the latest addition to its Fractilia Automated Measurement Environment (FAME™) portfolio, the FAME 300. Designed specifically for use in high-volume manufacturing (HVM) fab environments, the FAME 300 provides real-time measurement, detection and monitoring of stochastic effects, which are the single largest source of patterning errors at advanced nodes. With FAME 300, fabs can identify potential process problems caused by stochastic variations within minutes, enabling rapid corrective action to improve control over their patterning processes and optimize their yields.

Key Points: 
  • With FAME 300, fabs can identify potential process problems caused by stochastic variations within minutes, enabling rapid corrective action to improve control over their patterning processes and optimize their yields.
  • All measurements taken with Fractilia's products can be transferred from R&D to HVM and can be fully automated.
  • "Fractilia's FILM technology is the industry standard for stochastics metrology," stated Edward Charrier, CEO and president of Fractilia.
  • There is a clear need in the semiconductor industry to apply the accurate stochastics metrology that Fractilia has developed to HVM.

Fractilia Dares Chipmakers to Take the Fractilia Challenge for Up to 20X Better Scanning Electron Microscope Matching and Higher Throughput at No Obligation

Retrieved on: 
Tuesday, December 6, 2022

AUSTIN, Texas, Dec. 6, 2022 /PRNewswire/ -- Fractilia, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today announced that it has launched a new program that offers chipmakers the opportunity to achieve a 5-20x improvement in SEM tool-to-tool matching and up to 30 percent increased SEM tool throughput using the company's Fractilia Automated Measurement Environment (FAME™) product at no obligation.

Key Points: 
  • Fractilia will then measure the SEM images using FAME and prepare a custom report detailing the SEM tool performance as well as potential tool matching and throughput improvements.
  • With existing customers, the Fractilia Challenge has enabled a 5-20x improvement in tool-to-tool matching while simultaneously increasing SEM throughput by greater than 30 percent.
  • Fractilia has a unique way to help them achieve better matching with results that they've never seen before.
  • Fractilia is headquartered in Austin, Texas, and has numerous issued patents and hundreds of trade secrets covering its FILM and related technologies.

Territorium to Present at PlugFest 2 with Digital Credentials Consortium, Randa Solutions, and Jobs for the Future (JFF)

Retrieved on: 
Monday, November 14, 2022

SAN ANTONIO, Nov. 14, 2022 /PRNewswire/ -- Territorium, a global education technology leader with 10 million users across 15 countries, today announced it will co-lead a presentation alongside Digital Credentials Consortium, Randa Solutions, and Jobs for the Future (JFF) at PlugFest 2 on November 14, 2022. The presentation will demonstrate system-wide smart wallet interoperability, the operation of protocols, and the ability to send and receive verified credentials.

Key Points: 
  • The presentation will demonstrate system-wide smart wallet interoperability, the operation of protocols, and the ability to send and receive verified credentials.
  • "We are proud to be working with these leading institutions to propel the creation and adoption of verified credentials across all sectors."
  • Plugfest will take place in Mountain View, CA at the Computer History Museum the day before the Internet Identity Workshop (IIW).
  • Territorium is a global education technology company that makes learning and skills acquisition more accessible and measurable.

New Mexico College Publishes Report to Advance a National Learning and Employment Record for Skills-based Credentialing and Hiring

Retrieved on: 
Tuesday, October 11, 2022

ALBUQUERQUE, N.M., Oct. 11, 2022 /PRNewswire/ -- In the current job market, applicants are usually asked to provide a broad résumé that lists the basics of their qualifications including college degrees and past work experience. It's an outdated and inefficient system and one that Central New Mexico Community College (CNM) is now helping to improve. 

Key Points: 
  • It's an outdated and inefficient system and one that Central New Mexico Community College (CNM) is now helping to improve.
  • Thanks to a grant from Walmart, CNM produced a comprehensive report that researches several independent efforts underway in order to build a model for creating a national Learner and Employment Records (LER) infrastructure.
  • An LER enables the exchange of skills-based digital records that facilitate more efficient pathways from learning to earning.
  • The final LER report is called " A National Learning and Employment Record Infrastructure : Progress Towards a Skills Economy."

Teacher Wallet & Open Credential Publisher Awarded Learning and Employment Record (LER) Inclusive Design: Product Certification

Retrieved on: 
Monday, August 15, 2022

FRANKLIN, Tenn., Aug.15, 2022 /PRNewswire-PRWeb/ -- Teacher Wallet and Open Credential Publisher have both earned the Learning and Employment Records (LER) Inclusive Design: Product Certification from Digital Promise. The Product Certification serves as a reliable signal for educators, administrators, and employers, as well as learners and workers to quickly identify which technologies have been designed and developed to reduce and/or remove features that could result in biases and discrimination against potential end users.

Key Points: 
  • RANDA Solutions announces it has received product certification from Digital Promise for Teacher Wallet and Open Credential Publisher.
  • FRANKLIN, Tenn., Aug.15, 2022 /PRNewswire-PRWeb/ -- Teacher Wallet and Open Credential Publisher have both earned the Learning and Employment Records (LER) Inclusive Design: Product Certification from Digital Promise.
  • "Congratulations to Teacher Wallet and Open Credential Publisher for demonstrating that equity drives product design!"
  • Digital Promise launched the LER Inclusive Design: Product Certification in August 2022 and has certified three technologies to date.

Versa Networks Expands APAC and Japan Leadership Team to Continue Global Growth and Meet Accelerating APJ Region Demand for Versa SASE

Retrieved on: 
Tuesday, July 5, 2022

Ler joins Versa to lead the companys expanding APJ team with a focus on sales and market expansion to meet rapidly increasing demand for Versa SASE in the region.

Key Points: 
  • Ler joins Versa to lead the companys expanding APJ team with a focus on sales and market expansion to meet rapidly increasing demand for Versa SASE in the region.
  • I am excited to join at this important time for Versa, as I see tremendous opportunity across the APJ region, especially in this highly fragmented technology space.
  • I look forward to helping the team establish itself as the trusted advisor to customers and partners in the APJ region.
  • Versa Networks, VOS, the Versa logo, and Versa Titan are or may be registered trademarks of Versa Networks, Inc. All other marks and names mentioned herein may be trademarks of their respective companies.

NEW STOCHASTICS SOLUTION FROM FRACTILIA ENABLES SEMICONDUCTOR EUV FABS TO CONTROL MULTI-BILLION-DOLLAR INDUSTRY YIELD PROBLEM

Retrieved on: 
Monday, March 21, 2022

AUSTIN, March 21, 2022 /PRNewswire/ -- Fractilia, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today announced that it has released the latest version of its Fractilia Automated Measurement Environment (FAME™) product to enable semiconductor fabs to control the multi-billion-dollar EUV yield problem of stochastics. The FAME product line uniquely provides highly accurate and precise measurement of stochastics, which are the single largest source of patterning errors at advanced nodes. Armed with Fractilia's FAME product, fabs can make better decisions faster to solve this new class of yield killers and take back control over their advanced patterning processes, improving their device yields and patterning productivity. This latest release of FAME is built on Fractilia's proven third-generation Fractilia Inverse Linescan Model (FILM™) platform, which is already in use at four of the top five chip manufacturers.

Key Points: 
  • AUSTIN, March 21, 2022 /PRNewswire/ -- Fractilia, the leader in stochastics metrology and control solutions for advanced semiconductor manufacturing, today announced that it has released the latest version of its Fractilia Automated Measurement Environment (FAME) product to enable semiconductor fabs to control the multi-billion-dollar EUV yield problem of stochastics.
  • "Stochastics are becoming a major yield problem as semiconductor manufacturing moves further into the EUV production era," stated G. Dan Hutcheson, vice chair of TechInsights.
  • "Fractilia's founders, Ed Charrier and Chris Mack, have been early voices in raising the alarm on stochastics, and are well positioned to help the industry tackle this problem with stochastics control solutions.
  • Fabs need to measure stochastics in order to control them; however, existing methods are unable to measure stochastics with accuracy or precision.

The Latest “State-of-the Art” ArF Immersion Lithography Light Source “GT66A” Qualified Into HVM

Retrieved on: 
Tuesday, October 26, 2021

Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, has announced that advanced ArF immersion lithography light source GT66A is now fully up and running at semiconductor manufacturers around the world.

Key Points: 
  • Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, has announced that advanced ArF immersion lithography light source GT66A is now fully up and running at semiconductor manufacturers around the world.
  • Increasing demand for high-end devices that combine high-speed computing with low power consumption, especially autonomous driving and high-performance servers, is further driving this acceleration in demand.
  • The GT66A is a model that also supports 5 nm-node and beyond manufacturing required by semiconductors for such as leading-end devices.
  • The GT66A providing a feature of enhancing the EPE (Edge Placement Error) performance by reducing the speckle contrast (30%).