Gauss Labs and SK hynix Publish the Latest Results on AI-based Semiconductor Metrology Technology at SPIE AL 2024
SEOUL, South Korea, Feb. 29, 2024 /PRNewswire/ -- SK hynix Inc. (or "the company", www.skhynix.com) and Gauss Labs announced today that they participated in the SPIE AL* 2024, an international conference held in San Jose, California, and presented two papers based on the latest technology for AI-based metrology.
- In the paper "Model Aggregation for Virtual Metrology for High-Volume Manufacturing," Gauss Labs introduces "aggregated AOM*", an algorithm that increases the prediction accuracy of its AI-based virtual metrology solution, Panoptes VM (Virtual Metrology).
- In its second paper, "Universal Denoiser to Improve Metrology Throughput," Gauss Labs introduces a "universal denoiser", which removes random variations (noise) from CD-SEM* images.
- Through a series of extensive tests with SK hynix, Gauss Labs observed image acquisition time reduced to as much as ¼, compared to conventional technology.
- Gauss Labs states that this technology is expected to improve the productivity of metrology equipment by 42%.