Samsung and Nova Publish Joint Research at SPIE Advanced Lithography Conference
REHOVOT, Israel, Feb. 27, 2024 /PRNewswire/ -- Nova (Nasdaq: NVMI) today announced that it will publish two co-authored papers with Samsung R&D Center research at SPIE Advanced Lithography 2024. The papers will be presented at the SPIE by Nova and Samsung, at the Metrology, Inspection and Process Control conference.
- REHOVOT, Israel, Feb. 27, 2024 /PRNewswire/ -- Nova (Nasdaq: NVMI) today announced that it will publish two co-authored papers with Samsung R&D Center research at SPIE Advanced Lithography 2024.
- The papers will be presented at the SPIE by Nova and Samsung, at the Metrology, Inspection and Process Control conference.
- The papers are a result of the continuous collaboration between the companies that is driving numerous innovative joint development programs to enhance advanced chip manufacturing.
- The papers demonstrate multiple novel technologies Nova avails for advanced process control by developing unique solutions to measure critical parameters of interest on complex structures inside memory arrays.