TANAKA Develops "TRuST" Precursor for CVD/ALD Processes; Using Liquid Ruthenium Precursor to Achieve World's Highest Vapor Pressures
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수요일, 9월 30, 2020
(Head office: Chiyoda-ku, Tokyo; Representative Director & CEO: Koichiro Tanaka), which operates the TANAKA Precious Metals manufacturing business, has developed a new liquid ruthenium precursor named "TRuST" for CVD[1] and ALD[2] processes.
Key Points:
- (Head office: Chiyoda-ku, Tokyo; Representative Director & CEO: Koichiro Tanaka), which operates the TANAKA Precious Metals manufacturing business, has developed a new liquid ruthenium precursor named "TRuST" for CVD[1] and ALD[2] processes.
- CVD and ALD processes enable the formation of films with superior step coverage on various types of base substrate.
- TANAKA Kikinzoku Kogyo has developed a range of precious metal precursors over the years, including ruthenium precursors.
- As a result, this compound has the world's highest vapor pressure over 100 times higher than that of previous liquid ruthenium precursors.